HOPPING CONDUCTION AND DEFECT STATES IN REACTIVELY SPUTTERED SILICON NITRIDE THIN FILMS.

被引：0
|
作者：
Gier, L. [1 ]
Scharmann, A. [1 ]
Schalch, D. [1 ]
机构：
[1] Justus-Leibig-Univ Giessen, Giessen, West Ger, Justus-Leibig-Univ Giessen, Giessen, West Ger
来源：
Physica Status Solidi (A) Applied Research | 1986年 / 98卷 / 02期
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学科分类号：
摘要：
SILICON NITRIDE
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页码：605 / 610
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