Application of Monte Carlo simulation to a structural analysis for two-layered/substrate system

被引：0

作者：

Kinoshita, Akimasa ^{[1
]}

Hirai, Masaaki ^{[1
]}

Kusaka, Masahiko ^{[1
]}

Iwami, Motohiro ^{[1
]}

Yokota, Yasuhiro ^{[2
]}

机构：

[1] Research Laboratory for Surface Science, Faculty of Science, Okayama University, Okayama 700-8530, Japan

[2] Research Center for Microanalysis, Okayama University of Science, Okayama 700-0005, Japan

来源：

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers | 2000年 / 39卷 / 2 A期

关键词：

Computer simulation - Electron beams - Electron transitions - Emission spectroscopy - Monte Carlo methods - Multilayers - Nickel compounds - Silicon - Substrates - X ray spectroscopy;

D O I：

暂无

中图分类号：

学科分类号：

摘要：

Monte-Carlo simulation (MCS) using X-ray emission due to electron beam excitation is applied to determine the film thickness of a one-layer/substrate system. So far, the characteristic X-ray intensity has been used in this kind of simulation. However, it is difficult to utilize this method for a complicated system such as a multilayered structure. We succeeded in determining the layer thicknesses for a two-layered system, by a new method using characteristic Si-L2,3 soft X-ray emission band spectra. This method is shown to be promising for the quantitative analysis of multilayer and complicated systems. In this study, a quantitative analysis using both MCS and Si-L2,3 emission band spectra is demonstrated for the NiSi/NiSi2/Si system.

引用

页码：645 / 650