Application of Monte Carlo simulation to a structural analysis for two-layered/substrate system

被引：0
|
作者：
Kinoshita, Akimasa [1 ]
Hirai, Masaaki [1 ]
Kusaka, Masahiko [1 ]
Iwami, Motohiro [1 ]
Yokota, Yasuhiro [2 ]
机构：
[1] Research Laboratory for Surface Science, Faculty of Science, Okayama University, Okayama 700-8530, Japan
[2] Research Center for Microanalysis, Okayama University of Science, Okayama 700-0005, Japan
来源：
Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers | 2000年 / 39卷 / 2 A期
关键词：
Computer simulation - Electron beams - Electron transitions - Emission spectroscopy - Monte Carlo methods - Multilayers - Nickel compounds - Silicon - Substrates - X ray spectroscopy;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
Monte-Carlo simulation (MCS) using X-ray emission due to electron beam excitation is applied to determine the film thickness of a one-layer/substrate system. So far, the characteristic X-ray intensity has been used in this kind of simulation. However, it is difficult to utilize this method for a complicated system such as a multilayered structure. We succeeded in determining the layer thicknesses for a two-layered system, by a new method using characteristic Si-L2,3 soft X-ray emission band spectra. This method is shown to be promising for the quantitative analysis of multilayer and complicated systems. In this study, a quantitative analysis using both MCS and Si-L2,3 emission band spectra is demonstrated for the NiSi/NiSi2/Si system.
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页码：645 / 650
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