PLASMA FOCUS AS A RADIATION SOURCE FOR X-RAY LITHOGRAPHY.

被引：4
|
作者：
Eberle, J. [1 ]
Krompholz, H. [1 ]
Lebert, R. [1 ]
Neff, W. [1 ]
Noll, R. [1 ]
机构：
[1] Fraunhofer Inst fuer Lasertechnik, Aachen, West Ger, Fraunhofer Inst fuer Lasertechnik, Aachen, West Ger
来源：
Microelectronic Engineering | 1985年 / 3卷 / 1-4期
关键词：
D O I：
10.1016/0167-9317(85)90075-9
中图分类号：
学科分类号：
摘要：
LITHOGRAPHY
引用
收藏
页码：611 / 613
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