Sub-half-micron silicon pattern generation by electron beam direct writing on polysilane films

被引：0

作者：

Okamoto, Katsuhiko ^{[1
]}

Shin, Hidetoshi ^{[1
]}

Shiba, Kazutoshi ^{[1
]}

Miyazaki, Seiichi ^{[1
]}

Hirose, Masataka ^{[1
]}

机构：

[1] Hiroshima Univ, Hiroshima, Japan

来源：

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers | 1992年 / 31卷 / 12 B期

关键词：

D O I：

暂无

中图分类号：

学科分类号：

摘要：

引用

页码：4441 / 4443

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