Sub-half-micron silicon pattern generation by electron beam direct writing on polysilane films

被引：0
|
作者：
Okamoto, Katsuhiko [1 ]
Shin, Hidetoshi [1 ]
Shiba, Kazutoshi [1 ]
Miyazaki, Seiichi [1 ]
Hirose, Masataka [1 ]
机构：
[1] Hiroshima Univ, Hiroshima, Japan
来源：
Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers | 1992年 / 31卷 / 12 B期
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页码：4441 / 4443
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