Morphology of Small Particles of Binary Systems Forming Complete Solid Solutions Prepared by Gas-Evaporation Technique

被引：0
作者：
Ohno, T. [1 ]
机构：
[1] Department of Fundamental Science, Gifu National College of Technology, Motosu-gun, Gifu 501-0495, Shinsei-cho
来源：
Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers | 2003年 / 42卷 / 08期
关键词：
Binary system; Complete solid solution; Crystal morphology; Gas-evaporation technique; Small particle; Vapor growth;
D O I：
10.1143/jjap.42.5200
中图分类号：
学科分类号：
摘要：
The crystal morphology of small particles of the Cu-Au system, six binary alkali halide systems (KCl-RbCl, KCl-KBr, KCl-RbBr, KBr-RbCl, KBr-RbBr and RbCl-RbBr) and Si-Ge system prepared by gas-evaporation technique was investigated by electron microscopy. The experimental evidence that the mixing of constituent atoms or ions as well as the impurities contained in both the starting material and the atmospheric gas affect the crystal morphology of the small particles to let the external shape spherical for the Cu-Au and Si-Ge systems and the aspect ratio of external shape larger for the binary alkali halide systems was obtained in this study.
引用
收藏
页码：5200 / 5204
页数：4
相关论文
共 22 条
  • [1] Uyeda R., Prog. Mater. Sci., 35, (1991)
  • [2] Kimoto K., J. Jpn. Assoc. Cryst. Growth, 6, (1979)
  • [3] Yatsuya S., Kasukabe S., Uyeda R., Jpn. J. Appl. Phys., 12, (1973)
  • [4] Kasukabe S., Yatsuya S., Uyeda T., Jpn. J. Appl. Phys., 13, (1974)
  • [5] Ohno T., Yatsuya S., Uyeda T., Jpn. J. Appl. Phys., 15, (1976)
  • [6] Hayashi T., Ohno T., Yatsuya S., Uyeda T., Jpn. J. Appl. Phys., 16, (1977)
  • [7] Saito S., Yatsuya S., Mihama K., Uyeda R., Jpn. J. Appl. Phys., 17, (1978)
  • [8] Kimoto K., Nishida I., Jpn. J. Appl. Phys., 16, (1977)
  • [9] Okazaki T., J. Jpn. Assoc. Cryst. Growth, 6, (1987)
  • [10] Honda T., Suezawa M., Sumino K., Jpn. J. Appl. Phys., 35, (1996)
123