TEMPERATURE BEHAVIOUR OF THE CRYSTALLINE LATTICE OF ORIENTED POLYTETRAFLUOROETHYLENE DURING ANNEALING.

被引:0
|
作者
Shirina, N.G. [1 ]
Zubov, Yu.A. [1 ]
Kostromina, S.V. [1 ]
机构
[1] L. Ya. Karpov Physico-Chemical Research Institute, Russia
来源
Polymer science USSR | 1986年 / 28卷 / 06期
关键词
D O I
10.1016/0032-3950(86)90139-5
中图分类号
学科分类号
摘要
POLYTETRAFLUOROETHYLENE
引用
收藏
页码:1454 / 1460
相关论文
共 50 条
  • [21] DETERMINATION OF THRESHOLD POWER FOR SEMICONDUCTOR MELTING DURING LASER ANNEALING.
    Edelman, Piotr
    Kontkiewicz, Andrzej M.
    Electron Technology (Warsaw), 1985, 17 (3-4): : 25 - 33
  • [22] MEASUREMENT OF LATTICE TEMPERATURE OF SILICON DURING PULSED LASER ANNEALING
    STRITZKER, B
    POSPIESZCZYK, A
    TAGLE, JA
    PHYSICAL REVIEW LETTERS, 1981, 47 (05) : 356 - 358
  • [23] LATTICE TEMPERATURE OF GAAS AND SI DURING PULSED LASER ANNEALING
    POSPIESZCZYK, A
    HARITH, MA
    STRITZKER, B
    JOURNAL DE PHYSIQUE, 1983, 44 (NC-5): : 129 - 129
  • [24] VARIATIONS IN THE FLOW STRESS AND RESISTIVITY OF POLYCRYSTALLINE ZIRCONIUM DURING ALTERNATING LOW-TEMPERATURE DEFORMATION AND ANNEALING.
    Gindin, I.A.
    Starodubov, Ya.D.
    Sokolenko, V.I.
    Starolat, M.P.
    V'yugov, P.N.
    Physics of Metals and Metallography, 1979, 47 (05): : 148 - 152
  • [25] In situ measurement of crystalline lattice strains in phase IV polytetrafluoroethylene
    Brown, E. N.
    Clausen, B.
    Brown, D. W.
    JOURNAL OF NEUTRON RESEARCH, 2007, 15 (02) : 131 - 138
  • [26] ELECTRICAL BEHAVIOUR OF THERMALLY DIFFUSED SILICON SOLAR CELLS SUBMITTED TO RAPID ANNEALING.
    Fogarassy, E.
    Mesli, A.
    Courcelle, E.
    Grob, A.
    Siffert, P.
    Applied Physics A: Solids and Surfaces, 1985, A 37 (04): : 221 - 224
  • [27] Residual stresses due to high temperature annealing. Mathematical model and calculations
    Hachkevych, O. R.
    Mykhailyshyn, V. S.
    Ravska-Skotnichna, A.
    RESIDUAL STRESSES VII, 2006, 524-525 : 355 - 360
  • [28] Nanoscale charge nonuniformity on colloidal particles: Effects of dispersants and temperature annealing.
    Velegol, D
    Feick, J
    ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 2003, 226 : U359 - U359
  • [29] The removal of internal stress in 70 : 30 brass by low temperature annealing.
    Moore, H
    Beckinsale, S
    JOURNAL OF THE INSTITUTE OF METALS, 1920, 23 : 225 - 245
  • [30] Tribological properties of oriented polytetrafluoroethylene at room temperature and cryogenic temperature
    Cai, Peng
    Zhao, Meng
    Zhao, Bingbing
    Zhao, Gai
    Zheng, Fei
    Ni, Lingli
    POLYMER ENGINEERING AND SCIENCE, 2022, 62 (12): : 3935 - 3944