Relation between mechanical and structural properties of silicon-incorporated hard a-C:H films

被引：0
|
作者：
Universidade Federal do Rio de, Janeiro, Rio de Janeiro, Brazil [1 ]
机构：
来源：
Thin Solid Films | / 1-2卷 / 206-211期
关键词：
D O I：
暂无
中图分类号：
学科分类号：
摘要：
23
引用
收藏
相关论文
共 50 条
  • [1] Relation between mechanical and structural properties of silicon-incorporated hard a-C:H films
    Neto, ALB
    Santos, RA
    Freire, FL
    Camargo, SS
    Carius, R
    Finger, F
    Beyer, W
    THIN SOLID FILMS, 1997, 293 (1-2) : 206 - 211
  • [2] Internal stress reduction and structure of silicon incorporated hard a-C:H films
    Neto, ALB
    Santos, RA
    Freire, FL
    Camargo, SS
    SURFACES, VACUUM, AND THEIR APPLICATIONS, 1996, (378): : 268 - 274
  • [3] Influence of the process parameters on the characteristics of silicon-incorporated a-C:H:SiOx coatingsD. Batory
    Batory, D.
    Jedrzejczak, A.
    Kaczorowski, W.
    Szymanski, W.
    Kolodziejczyk, L.
    Clapa, M.
    Niedzielski, P.
    SURFACE & COATINGS TECHNOLOGY, 2015, 271 : 112 - 118
  • [4] Structural modifications and temperature stability of silicon incorporated diamond-like a-C:H films
    Camargo, SS
    Santos, RA
    Neto, ALB
    Carius, R
    Finger, F
    THIN SOLID FILMS, 1998, 332 (1-2) : 130 - 135
  • [5] Mechanical properties of a-C:H multilayer films
    Qi, J
    Lai, KH
    Lee, CS
    Bello, I
    Lee, ST
    Luo, JB
    Wen, SZ
    DIAMOND AND RELATED MATERIALS, 2001, 10 (9-10) : 1833 - 1838
  • [6] Structural and mechanical properties of a-C:H and Si doped a-C:H thin films grown by LF-PECVD
    Chouquet, C.
    Gerbaud, G.
    Bardet, M.
    Barrat, S.
    Billard, A.
    Sanchette, F.
    Ducros, C.
    SURFACE & COATINGS TECHNOLOGY, 2010, 204 (9-10): : 1339 - 1346
  • [7] Improvement of mechanical properties of a-C:H by silicon addition
    DeMartino, C
    Fusco, G
    Mina, G
    Tagliaferro, A
    Vanzetti, L
    Calliari, L
    Anderle, M
    DIAMOND AND RELATED MATERIALS, 1997, 6 (5-7) : 559 - 563
  • [8] Growth conditions and mechanical properties of a-C:H films
    Northeastern University, Shenyang 110004, China
    Zhenkong Kexue yu Jishu Xuebao, 2008, 1 (64-66):
  • [9] Structural characterization of hard a-C:H films as a function of the methane pressure
    Lacerda, RG
    Stolojan, V
    Cox, DC
    Silva, SRP
    Marques, FC
    DIAMOND AND RELATED MATERIALS, 2002, 11 (3-6) : 980 - 984
  • [10] Structural and mechanical properties of a-C:H thin films grown by RF-PECVD
    Tomasella, E
    Thomas, L
    Dubois, M
    Meunier, C
    DIAMOND AND RELATED MATERIALS, 2004, 13 (09) : 1618 - 1624
12345