Electrochemical aspects of corrosion resistance and etching of metallizations for microelectronics

被引：0
|
作者：
Comizzoli, R.B. [1 ]
Frankenthal, R.P. [1 ]
Hanson, K.J. [1 ]
Konstadinidis, K. [1 ]
Opila, R.L. [1 ]
Sapjeta, J. [1 ]
Sinclair, J.D. [1 ]
Takahashi, K.M. [1 ]
Frank, A.L. [1 ]
Ibidunni, A.O. [1 ]
机构：
[1] AT&T Bell Lab, Murray Hill, United States
来源：
Materials Science and Engineering A | 1995年 / A198卷 / 1-2期
关键词：
Etching;
D O I：
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摘要：
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页码：153 / 160
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