GaAs oxide removal using hydrogen plasma studied by surface second-harmonic generation

被引：0
|
作者：
Kimura, Takahiro [1 ]
Yamada, Chikashi [1 ]
机构：
[1] Optoelectronics Technology Research, Lab, Ibaraki, Japan
来源：
Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes & Review Papers | 1995年 / 34卷 / 03期
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摘要：
13
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页码：1498 / 1501
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