Preparing conductive transparent ITO films on glass at 200°C by RF and DC magnetron sputtering

被引：0
|
作者：
Ishida, T. [1 ]
Kobayashi, H. [1 ]
Mochizuki, S. [1 ]
Tabata, O. [1 ]
机构：
[1] Osaka National Research Institute, Ikeda, Osaka 563-8577, Japan
来源：
Shinku/Journal of the Vacuum Society of Japan | 2001年 / 44卷 / 06期
关键词：
D O I：
10.3131/jvsj.44.588
中图分类号：
学科分类号：
摘要：
8
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页码：588 / 591
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