Metallography of very large scale integrated circuits

被引：0
|
作者：
Metallographie an hochintegrierten Schaltkreisen
机构：
[1] Burger, K.
[2] Brenner, D.
来源：
Burger, K. | 1990年 / 27期
关键词：
Metallography - Specimen Preparation - Quality Control - Nondestructive Examination;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
Three metallographic preparation techniques are described which provide a wide investigation spectrum of integrated components. The thin-film composition of chips with diverse insulation and metallization films can be revealed in the optical microscope using the oblique section technique. Precipitation phenomena of silicon at the phase boundaries, in the metallization matrix and at the grain boundaries of the metallization are described. Copper-containing particles precipitated as a result of electromigration transport phenomena in AlSi(1)Cu(4) or AlSi(0.5)Cu(0.5) metallization lines are detected metallographically and analytically (WDX, EDX). The pores at the negative pole as well as the location of the Al2Cu precipitates in the metallization lines could be explained by material transport due to electromigration.
引用
收藏
相关论文
共 50 条
  • [1] Wiring Algorithms for Very Large Scale Integrated Circuits.
    Rothermel, Hans-Juergen
    Fortschritt-Berichte der VDI-Zeitschriften, Reihe 10: Angewandte Informatik, 1984, (32):
  • [2] WSI, INTERCONNECTIONS FOR VERY-LARGE-SCALE INTEGRATED-CIRCUITS
    SARASWAT, KC
    THIN SOLID FILMS, 1981, 83 (02) : 143 - 144
  • [3] INTEGRATED SEMICONDUCTOR CIRCUITS APPROACH VERY LARGE-SCALE INTEGRATION
    RUCHARDT, H
    NACHRICHTENTECHNISCHE ZEITSCHRIFT, 1978, 31 (09): : 660 - 668
  • [4] SIMULATION OF VERY LARGE SCALE INTEGRATED CIRCUITS. AN OVERVIEW.
    Garbs, R.T.
    Modeling and Simulation, Proceedings of the Annual Pittsburgh Conference, 1979,
  • [5] Planarization of dielectrics used in the manufacture of very-large-scale integrated circuits
    Malik, Farid
    Solanki, Raj
    Thin Solid Films, 1990, 194 (1 -2 pt 2) : 1030 - 1037
  • [6] Advanced Fabrication Processes for Superconducting Very Large-Scale Integrated Circuits
    Tolpygo, Sergey K.
    Bolkhovsky, Vladimir
    Weir, T. J.
    Wynn, Alex
    Oates, D. E.
    Johnson, L. M.
    Gouker, M. A.
    IEEE TRANSACTIONS ON APPLIED SUPERCONDUCTIVITY, 2016, 26 (03)
  • [7] Very large scale integrated circuits for data processing applications - Approaches and problems
    Muller-Glaser, K.
    IT - Information Technology, 1982, 24 (1-6): : 207 - 217
  • [8] Integrated Semiconductor Circuits on the Way toward Very Large Scale Integration.
    Ruechardt, Hugo
    1978, 31 (09): : 660 - 668
  • [9] VERY LARGE-SCALE INTEGRATED-CIRCUITS (VLSI) AND FUTURE OF COMPUTER
    KOBAYASHI, T
    FUJITSU SCIENTIFIC & TECHNICAL JOURNAL, 1977, 13 (04): : 1 - 19
  • [10] Test methods of total dose effects in very large scale integrated circuits
    He, CH
    Geng, B
    He, BP
    Yao, YJ
    Li, YH
    Peng, HL
    Lin, DS
    Zhou, H
    Chen, YS
    ACTA PHYSICA SINICA, 2004, 53 (01) : 194 - 199
12345