New approaches to alternating phase shift mask inspection

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作者：
KLA-Tencor Corporation, 160 Rio Robles, San Jose, CA 95134-1809, United States [1 ]
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来源：
Proc SPIE Int Soc Opt Eng | / 138-144期
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Compendex;
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摘要：
Algorithms - Defects - Etching - Light reflection - Lithography - Phase shift
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