CLEAN MODULE: ADVANCED TECHNOLOGY FOR PROCESSING SILICON WAFERS.

被引:0
|
作者
Golland, D.I.
Albrecht, P.D.
Krusell, W.C.
Puerto, F.A.
机构
关键词
D O I
暂无
中图分类号
学科分类号
摘要
6
引用
收藏
页码:184 / 187
相关论文
共 50 条
  • [1] MeV ION IMPLANTATION SYSTEMS FOR PRODUCTION PROCESSING OF SILICON WAFERS.
    Norton, G.A.
    Klody, G.M.
    IEEE Transactions on Nuclear Science, 1982, NS-30 (02) : 1701 - 1704
  • [2] Efficient cleaning of silicon wafers.
    Kommu, S
    Sinha, D
    Knieling, J
    ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 2003, 226 : U403 - U403
  • [3] PREOXIDATION UV TREATMENT OF SILICON WAFERS.
    Ruzyllo, J.
    Duranko, G.T.
    Hoff, A.M.
    Journal of the Electrochemical Society, 1987, 134 (08) : 2052 - 2055
  • [4] MASK ALIGNING FIXTURE FOR SILICON WAFERS.
    Christensen, R.G.
    Imrie, R.W.
    1600, (27):
  • [5] Gettering of copper in bonded silicon wafers.
    Mulestagno, L
    Iyer, S
    Craven, RA
    Fraundorf, P
    PROCEEDINGS OF THE SEVENTH INTERNATIONAL SYMPOSIUM ON SILICON-ON-INSULATOR TECHNOLOGY AND DEVICES, 1996, 96 (03): : 176 - 182
  • [6] INFLUENCE OF CARBON ON THE DEFECT GENERATION IN IG SILICON WAFERS.
    Tan, Songsheng
    Shen, Jinyuan
    Li, Yuezhen
    Pan Tao Ti Hsueh Pao/Chinese Journal of Semiconductors, 1986, 7 (05): : 489 - 496
  • [7] DOUBLE-SIDED SILICON NITRIDE DEPOSITION OF WAFERS.
    Anon
    1600, (28):
  • [8] SCREEN-PRINTABLE POLYIMIDE COATING FOR SILICON WAFERS.
    Kulesza, Frank W.
    Estes, Richard H.
    Spanjer, Keith
    1600, (31):
  • [9] Comparison between implanted boron and phosphorus in silicon wafers.
    Burgess, J. E.
    Johnson, B. C.
    Villis, B. J.
    McCallum, J. C.
    Charnvanichborikarn, S.
    Wong-Leung, J.
    Williams, J. S.
    PROCEEDINGS OF 2010 CONFERENCE ON OPTOELECTRONIC AND MICROELECTRONIC MATERIALS AND DEVICES (COMMAND 2010), 2010, : 225 - 226
  • [10] LUMINESCENCE METHOD AND DEVICE FOR THE CONTROL OF UNIFORMITY OF DIELECTRIC COATINGS ON SILICON WAFERS.
    Aksel'rod, I.L.
    Vereshchagin, V.G.
    Zakharov, A.N.
    Kurkin, Yu.P.
    Skotnikov, M.M.
    Tsarev, V.P.
    1600, (51):