共 7 条
- [1] TRIANGULAR SHAPED BEAM TECHNIQUE IN EB EXPOSURE SYSTEM EX-7 FOR ULSI PATTERN-FORMATION JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1989, 28 (10): : 2065 - 2069
- [2] INTEGRATED DATA CONVERSION FOR THE ELECTRON-BEAM EXPOSURE SYSTEM EX-7 JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1988, 6 (06): : 2061 - 2065
- [3] THE ELECTRON-BEAM COLUMN FOR A HIGH-DOSE AND HIGH-VOLTAGE ELECTRON-BEAM EXPOSURE SYSTEM EX-7 JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1988, 6 (01): : 209 - 212
- [4] PROXIMITY EFFECT CORRECTION FOR AN ELECTRON-BEAM DIRECT WRITING SYSTEM EX-7 JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1989, 7 (06): : 1524 - 1527
- [5] ADVANCED PATTERN DATA-PROCESSING TECHNIQUE FOR A RASTER SCAN ELECTRON-BEAM EXPOSURE SYSTEM JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1981, 19 (04): : 988 - 992
- [6] EB60 - AN ADVANCED DIRECT WAFER EXPOSURE ELECTRON-BEAM LITHOGRAPHY SYSTEM FOR HIGH-THROUGHPUT, HIGH-PRECISION, SUBMICRON PATTERN WRITING JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1987, 5 (01): : 61 - 65