Novel mononuclear alkoxide precursors for the MOCVD of ZrO2 and HfO2 thin films

被引：0
|
作者：
Williams, Paul A. [1 ]
Roberts, John L. [1 ]
Jones, Anthony C. [1 ]
Chalker, Paul R. [1 ]
Tobin, Neil L. [1 ]
Bickley, Jamie F. [1 ]
Davies, Hywel O. [1 ]
Smith, Lesley M. [1 ]
Leedham, Timothy J. [1 ]
机构：
[1] Department of Chemistry, University of Liverpool, Liverpool, L69 3ZD, United Kingdom
来源：
Advanced Materials | 2002年 / 14卷 / 13-14期
关键词：
Ligands - Mononuclear precursors;
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摘要：
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页码：163 / 170
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