Self-ordering of CoSi2 precipitates and epitaxial layer growth of CoSi2 on Si(100)

被引：0

作者：

Mantl, S. ^{[1
]}

Hacke, M. ^{[1
]}

Bay, H.L. ^{[1
]}

Kappius, L. ^{[1
]}

Mesters, St. ^{[1
]}

机构：

[1] Forschungszentrum Juelich, Juelich, Germany

来源：

Thin Solid Films | 1998年 / 321卷

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摘要：

引用

页码：251 / 255

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