Reduced damage reactive ion etching process for fabrication of InGaAsP/InGaAs multiple quantum well ridge waveguide lasers

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Qiu, B.C.
Ooi, B.S.
Bryce, A.C.
Hicks, S.E.
Wilkinson, C.D.W.
De La Rue, R.M.
Marsh, J.H.
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Journal of Vacuum Science & Technology B: Microelectronics Processing and Phenomena | 1998年 / 16卷 / 04期
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