Application of irradiation-then-anneal treatment on the improvement of oxide properties in metal-oxide-semiconductor capacitors

被引：0
|
作者：
Lin, Jin-Jenn [1 ]
Hwu, Jenn-Gwo [1 ]
机构：
[1] Natl Taiwan Univ, Tainei, Taiwan
来源：
Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers | 1992年 / 31卷 / 5 A期
关键词：
27;
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页码：1290 / 1297
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