Chemical treatment effects of Si surfaces in NH4OH:H2O2:H2O solutions studied by spectroscopic ellipsometry

被引：0
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作者：
Adachi, Sadao [1 ]
Utani, Katsuyuki [1 ]
机构：
[1] Gunma Univ, Gunma, Japan
来源：
Japanese Journal of Applied Physics, Part 2: Letters | 1993年 / 32卷 / 9 A期
关键词：
Ammonium compounds - Composition effects - Ellipsometry - Etching - Hydrogen peroxide - Oxidation - Oxides - Solutions - Spectroscopy - Surface properties - Water;
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摘要：
Chemically treated Si surfaces in 1NH4OH:XH2O2:5H2O (X = 0 and 1) solutions at 80 °C have been studied using spectroscopic ellipsometry (SE). The SE data clearly indicate that the X = 0 solution results in surface roughening while the X = 1 solution, in surface chemical oxidation. It is found that chemical oxidation occurs immediately upon immersing the sample in the X = 1 solution. The thickness of the oxide is also found to show a saturated value of approximately 11 angstroms against immersion time t.
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