Chemical treatment effects of Si surfaces in NH4OH:H2O2:H2O solutions studied by spectroscopic ellipsometry

被引：0
|
作者：
Adachi, Sadao [1 ]
Utani, Katsuyuki [1 ]
机构：
[1] Gunma Univ, Gunma, Japan
来源：
Japanese Journal of Applied Physics, Part 2: Letters | 1993年 / 32卷 / 9 A期
关键词：
Ammonium compounds - Composition effects - Ellipsometry - Etching - Hydrogen peroxide - Oxidation - Oxides - Solutions - Spectroscopy - Surface properties - Water;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
Chemically treated Si surfaces in 1NH4OH:XH2O2:5H2O (X = 0 and 1) solutions at 80 °C have been studied using spectroscopic ellipsometry (SE). The SE data clearly indicate that the X = 0 solution results in surface roughening while the X = 1 solution, in surface chemical oxidation. It is found that chemical oxidation occurs immediately upon immersing the sample in the X = 1 solution. The thickness of the oxide is also found to show a saturated value of approximately 11 angstroms against immersion time t.
引用
收藏
相关论文
共 50 条
  • [21] Kinetics of GaAs dissolution in H2O2-NH4OH-H2O solutions
    Bryce, C
    Berk, D
    INDUSTRIAL & ENGINEERING CHEMISTRY RESEARCH, 1996, 35 (12) : 4464 - 4470
  • [22] Kinetics of GaAs dissolution in H2O2-NH4OH-H2O solutions
    Bryce, Christine
    Berk, Dimitrios
    Industrial and Engineering Chemistry Research, 1996, 35 (12): : 4464 - 4470
  • [23] ISOLATED NANOMETER-SIZE SI DOT ARRAYS FABRICATED USING ELECTRON-BEAM LITHOGRAPHY, REACTIVE ION ETCHING, AND WET ETCHING IN NH4OH/H2O2/H2O
    NAKAJIMA, A
    AOYAMA, H
    KAWAMURA, K
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1994, 33 (12B): : L1796 - L1798
  • [24] Electron scattering and ionization of H2O; OH, H2O2, HO2 radicals and (H2O)2 dimer
    Joshipura, Kamalnayan N.
    Pandya, Siddharth H.
    Mason, Nigel J.
    EUROPEAN PHYSICAL JOURNAL D, 2017, 71 (04):
  • [25] Electron scattering and ionization of H2O; OH, H2O2, HO2 radicals and (H2O)2 dimer
    Kamalnayan N. Joshipura
    Siddharth H. Pandya
    Nigel J. Mason
    The European Physical Journal D, 2017, 71
  • [26] The water trimer reaction OH + (H2O)3 → (H2O)2OH + H2O
    Gao, Aifang
    Li, Guoliang
    Peng, Bin
    Weidman, Jared D.
    Xie, Yaoming
    Schaefer, Henry F.
    PHYSICAL CHEMISTRY CHEMICAL PHYSICS, 2020, 22 (17) : 9767 - 9774
  • [27] ON THE REACTIONS OF F ATOMS WITH H2O, H2O2, AND NH3
    WALTHER, CD
    WAGNER, HG
    BERICHTE DER BUNSEN-GESELLSCHAFT-PHYSICAL CHEMISTRY CHEMICAL PHYSICS, 1983, 87 (05): : 403 - 409
  • [28] THE RELATIONSHIP OF THE SILICON SURFACE-ROUGHNESS AND GATE OXIDE INTEGRITY IN NH4OH/H2O2 MIXTURES
    MEURIS, M
    VERHAVERBEKE, S
    MERTENS, PW
    HEYNS, MM
    HELLEMANS, L
    BRUYNSERAEDE, Y
    PHILIPOSSIAN, A
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 1992, 31 (11A): : L1514 - L1517
  • [29] Micro/nano hierarchical structured titanium treated by NH4OH/H2O2 for enhancing cell response
    Yuan, Xin
    Kang, Yi
    Zuo, Jun
    Xie, Youneng
    Ma, Li
    Ren, Xuelei
    Bien, Zeyu
    Wei, Qiuping
    Zhou, Kechao
    Wang, Xiyang
    Yu, Zhiming
    PLOS ONE, 2018, 13 (05):
  • [30] High-Frequency SiC Microdisk Resonators Operating in Water with Responses to H2O2 and NH4OH
    Jia, Hao
    Lee, Jaesung
    Wang, Zenghui
    Feng, Philip X. -L.
    2014 IEEE INTERNATIONAL FREQUENCY CONTROL SYMPOSIUM (FCS), 2014, : 24 - 27
12345