Chemical treatment effects of Si surfaces in NH4OH:H2O2:H2O solutions studied by spectroscopic ellipsometry

被引：0

作者：

Adachi, Sadao ^{[1
]}

Utani, Katsuyuki ^{[1
]}

机构：

[1] Gunma Univ, Gunma, Japan

来源：

Japanese Journal of Applied Physics, Part 2: Letters | 1993年 / 32卷 / 9 A期

关键词：

Ammonium compounds - Composition effects - Ellipsometry - Etching - Hydrogen peroxide - Oxidation - Oxides - Solutions - Spectroscopy - Surface properties - Water;

D O I：

暂无

中图分类号：

学科分类号：

摘要：

Chemically treated Si surfaces in 1NH4OH:XH2O2:5H2O (X = 0 and 1) solutions at 80 °C have been studied using spectroscopic ellipsometry (SE). The SE data clearly indicate that the X = 0 solution results in surface roughening while the X = 1 solution, in surface chemical oxidation. It is found that chemical oxidation occurs immediately upon immersing the sample in the X = 1 solution. The thickness of the oxide is also found to show a saturated value of approximately 11 angstroms against immersion time t.

引用

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[1] CHEMICAL TREATMENT EFFECTS OF SI SURFACES IN NH4OH H2O2 H2O SOLUTIONS STUDIED BY SPECTROSCOPIC ELLIPSOMETRY
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JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 1993, 32 (9A): : L1189 - L1191
[2] CHEMICAL TREATMENT EFFECT OF SI SURFACES IN 1NH4OH-XH2O2-5H2O SOLUTIONS STUDIED BY SPECTROSCOPIC ELLIPSOMETRY
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