Proximity effect correction in projection electron beam lithography (scattering with angular limitation projection electron-beam lithography)

被引：0
|
作者：
Liddle, J.Alexander [1 ]
Watson, G.Patrick [1 ]
Berger, Steven D. [1 ]
Miller, Peter D. [1 ]
机构：
[1] AT&T Bell Lab, Murray Hill, United States
来源：
Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes & Review Papers | 1995年 / 34卷 / 12 B期
关键词：
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
收藏
页码：6672 / 6678
相关论文
共 50 条
  • [11] PROXIMITY EFFECT CORRECTION IN ELECTRON-BEAM LITHOGRAPHY
    KATO, T
    WATAKABE, Y
    NAKATA, H
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1981, 19 (04): : 1279 - 1285
  • [12] Preliminary results from a prototype projection electron-beam stepper-scattering with angular limitation projection electron beam lithography proof-of-concept system
    Harriott, LR
    Berger, SD
    Biddick, C
    Blakey, MI
    Bowler, SW
    Brady, K
    Camarda, RM
    Connelly, WF
    Crorken, A
    Custy, J
    Dimarco, R
    Farrow, RC
    Felker, JA
    Fetter, L
    Freeman, R
    Hopkins, L
    Huggins, HA
    Knurek, CS
    Kraus, JS
    Liddle, JA
    Mkrtychan, M
    Novembre, AE
    Peabody, ML
    Tarascon, RG
    Wade, HH
    Waskiewicz, WK
    Watson, GP
    Werder, KS
    Windt, D
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1996, 14 (06): : 3825 - 3828
  • [13] A fast and simplified technique of proximity effect correction for ULSI patterns in electron-beam projection lithography
    Ogino, K
    Hoshino, H
    Machida, Y
    MICROPROCESSES AND NANOTECHNOLOGY 2001, DIGEST OF PAPERS, 2001, : 254 - 255
  • [14] STRATEGY FOR THE CORRECTION OF THE PROXIMITY EFFECT IN ELECTRON-BEAM LITHOGRAPHY
    HUBNER, H
    MICROELECTRONIC ENGINEERING, 1992, 18 (04) : 275 - 293
  • [15] PROXIMITY-EFFECT CORRECTION IN ELECTRON-BEAM LITHOGRAPHY
    VERMEULEN, P
    JONCKHEERE, R
    VANDENHOVE, L
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1989, 7 (06): : 1556 - 1560
  • [16] A background dose proximity effect correction technique for scattering with angular limitation projection electron lithography implemented in hardware
    Watson, GP
    Berger, SD
    Liddle, JA
    Waskiewicz, WK
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1995, 13 (06): : 2504 - 2507
  • [17] PROJECTION ELECTRON-BEAM LITHOGRAPHY - A NEW APPROACH
    BERGER, SD
    GIBSON, JM
    CAMARDA, RM
    FARROW, RC
    HUGGINS, HA
    KRAUS, JS
    LIDDLE, JA
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1991, 9 (06): : 2996 - 2999
  • [18] Fabrication of masks for electron-beam projection lithography
    Lercel, M
    Magg, C
    Barrett, M
    Collins, K
    Trybendis, M
    Caldwell, N
    Jeffer, R
    Bouchard, L
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2000, 18 (06): : 3210 - 3215
  • [19] Stencil masks for electron-beam projection lithography
    Kurihara, K
    Iriguchi, H
    Motoyoshi, A
    Tabata, T
    Takahashi, S
    Iwamoto, K
    Okada, I
    Yoshihara, H
    Noguchi, H
    PHOTOMASK AND NEXT-GENERATION LITHOGRAPHY MASK TECHNOLOGY VIII, 2001, 4409 : 726 - 733
  • [20] Background dose proximity effect correction technique for scattering with angular limitation projection electron lithography implemented in hardware
    J Vac Sci Technol B, 6 (2504):
12345