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Univ Autonoma de Barcelona, Barcelona, Spain, Univ Autonoma de Barcelona, Barcelona, SpainUniv Autonoma de Barcelona, Barcelona, Spain, Univ Autonoma de Barcelona, Barcelona, Spain
Millan, J.
[1
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Villaronga, V.
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Univ Autonoma de Barcelona, Barcelona, Spain, Univ Autonoma de Barcelona, Barcelona, SpainUniv Autonoma de Barcelona, Barcelona, Spain, Univ Autonoma de Barcelona, Barcelona, Spain
Villaronga, V.
[1
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Morante, J.R.
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Univ Autonoma de Barcelona, Barcelona, Spain, Univ Autonoma de Barcelona, Barcelona, SpainUniv Autonoma de Barcelona, Barcelona, Spain, Univ Autonoma de Barcelona, Barcelona, Spain
Morante, J.R.
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Serra-Mestres, F.
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Univ Autonoma de Barcelona, Barcelona, Spain, Univ Autonoma de Barcelona, Barcelona, SpainUniv Autonoma de Barcelona, Barcelona, Spain, Univ Autonoma de Barcelona, Barcelona, Spain
Serra-Mestres, F.
[1
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Herms, A.
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Univ Autonoma de Barcelona, Barcelona, Spain, Univ Autonoma de Barcelona, Barcelona, SpainUniv Autonoma de Barcelona, Barcelona, Spain, Univ Autonoma de Barcelona, Barcelona, Spain
Herms, A.
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机构:
[1] Univ Autonoma de Barcelona, Barcelona, Spain, Univ Autonoma de Barcelona, Barcelona, Spain
The capacitance of the Al-SiO//2( less than 60 A)-Si(n)-Si(p** plus ) structure has been measured at different dc bias for several frequencies. The experimental capacitance decreases sharply as reverese dc bias is increased, passes through zero, and attains a negative value. A similar behavior is observed at low frequencies when the structure is forward biased. This unusual behavior is explained considering the interaction of the carriers with the interface states at the I-S interface and the influence of the electric field on the tunneling emission rate of these states.