An analysis of the processes, occurring in the ion-optical systems (IOS) of plasma sources of ions on the basis of algorithms for the solution of stationary self-consistent problems shows that these solutions are sensitive to the physical conditions at the plasma surfaces. This note shows that rigorous conditions on the emitter can be obtained by the simultaneous solution of the equation for the layer near the electrode and the equations of motion of test particles in a central force field, calculated in terms of the known interaction cross sections. This method makes it possible to improve the accuracy of the design of ion-optical systems.