AC hot-carrier degradation due to gate-pulse-induced noise

被引：0
|
作者：
Izawa, Ryuichi [1 ]
Umeda, Kazunori [1 ]
Takeda, Eiji [1 ]
机构：
[1] Hitachi Ltd, Kodaira, Japan
来源：
Electronics and Communications in Japan, Part II: Electronics (English translation of Denshi Tsushin Gakkai Ronbunshi) | 1991年 / 74卷 / 11期
关键词：
AC Hot Carrier Degradation - AC Stress Application Time Ratio - Gate Pulse Induced Noise - Passivation Film Formation Process;
D O I：
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中图分类号：
学科分类号：
摘要：
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页码：50 / 57
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