Low-temperature deposition of AlN films

被引：0

|

作者：

Sun, Jian ^{[1
]}

Wu, Jiada ^{[1
]}

Ying, Zhifeng ^{[1
]}

Shi, Wei ^{[1
]}

Ling, Hao ^{[1
]}

Zhou, Zhuying ^{[1
]}

Ding, Xunmin ^{[1
]}

Wang, Kanglin ^{[1
]}

Li, Fuming ^{[1
]}

机构：

[1] Fudan Univ, Shanghai, China

来源：

Pan Tao Ti Hsueh Pao/Chinese Journal of Semiconductors | 2000年 / 21卷 / 09期

关键词：

Low temperature deposition;

D O I：

暂无

中图分类号：

学科分类号：

摘要：

(Edited Abstract)

引用

收藏

页码：914 / 917

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