Silicon-germanium quantum-cascade lasers

被引:6
作者
Kelsall, Robert W. [1 ]
Soref, Richard A. [2 ]
机构
[1] Sch. of Electron./Elec. Engineering, University of Leeds
[2] Sensors Directorate, Air Force Research Laboratory, Hanscom AFB
关键词
Intersubband; Silicon optoelectronics; Terahertz; Virtual substrate;
D O I
10.1142/S012915640300182X
中图分类号
学科分类号
摘要
The prospects and advantages of silicon germanium quantum cascade lasers are discussed, from both physical and technological perspectives. A range of Si/SiGe intersubband laser configurations are discussed, for both edge and surface emission. Recent experimental activity on mid- and far-infrared devices is reviewed, and the value of detailed theoretical tools for heterostructure design is highlighted. Steps towards silicon optoelectronic integration are also considered.
引用
收藏
页码:547 / 573
页数:26
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[1]  
Rieger M., Vogl P., Phys Rev B, (1983)
[2]  
Stein B.L., Yu E.T., Croke E.T., Hunter A.T., Lauritzen T., Mayer J.W., Ahn C.C., J. Vac. Sci. Technol. B, 16, pp. 1639-1643, (1998)
[3]  
Paul D.J., Adv. Mater., 11, (1999)
[4]  
Giovane L.M., Luan H.C., Fitzgerald E.A., Kimerling L.C., Strained SiGe Materials for High Quantum Efficiency Photodiodes at 1300 to 1550 nm, (1999)
[5]  
Kelsall R.W., Ikonic Z., Harrison P., Lynch S.A., Bates R., Paul D.J., Norris D.J., Liew S.L., Cullis A.G., Robbins D.J., Murzyn P., Pidgeon C.R., Arnone D.D., Soref R.A., Silicon germanium quantum cascade heterostructures for far-infrared emission, Proc. SPIE Photonics West Conference, (2002)
[6]  
Currie M.T., Samavedam S.B., Langdo T.A., Leitz C.W., Fitzgerald E.A., Controlled threading dislocation densities in Ge-on-Si using graded SiGe layers and chemical-mechanical polishing, Appl. Phys. Lett., 72, (1998)
[7]  
Lyutovich K., Bauer M., Kasper E., Herzog H.J., Perova T., Maurice R., Hofer C., Teichert C., Mat. Sci. & Eng. B, 89, (2002)
[8]  
Cheng Z.-Y., Currie M.T., Leitz C.W., Taraschi G., Pitera A., Lee M.L., Langdo T.A., Hoyt J., Antoniadis D.A., Fitzgerald E.A., Silicon Germanium on Insulator, Materials Research Society Meeting, (2001)
[9]  
Mizuno T., Sugiyama N., Tezuka T., Relaxed SiGe-on-insulator substrates without thick SiGe buffer layers, Appl. Phys. Lett., 80, (2002)
[10]  
Sheng S., Dion M., McAlister S.P., Growth and characterization of UHV-CVD strained-layer superlattices on bulk crystal SiGe substrates, Materials Research Society Meeting, (2001)