SOI technology for sub-0.25 μm CMOS

被引：0

作者：

Maszara, W.P. ^{[1
]}

机构：

[1] SEMATECH, Sunnyvale, United States

来源：

Electron Technology (Warsaw) | 1999年 / 32卷 / 01期

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页码：16 / 20

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