PHOTORESIST TECHNOLOGY UPDATE.

被引：0
|
作者：
Weiss, Aaron D.
机构：
来源：
Semiconductor International | 1983年 / 04期
关键词：
INTEGRATED CIRCUIT MANUFACTURE;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
Negative photoresists still predominate but as geometries shrink positive photoresists are gaining ground. E-beam resists for direct write and x-ray resists are still in the future. Some topics discussed are these: resolution; development systems; plasma developable photoresist; metal-ion-free developers; negative versus positive resists; new developments; multilevel techniques; contrast enhancement; E-beam resists; X-ray resists; and some conclusions.
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页码：82 / 87
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