Fabrication of silicon field emitter arrays integrated with beam focusing lens

被引：0
|
作者：
Yamaoka, Yoshikazu [1 ]
Kanemaru, Seigo [1 ]
Itoh, Junji [1 ]
机构：
[1] Sanyo Electric. Co, Ltd, Ibaraki, Japan
来源：
Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes & Review Papers | 1996年 / 35卷 / 12 B期
关键词：
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
收藏
页码：6347 / 6695
相关论文
共 50 条
  • [21] Fabrication of iridium field emitter arrays
    Chalamala, BR
    Wei, Y
    Rossi, G
    Smith, BG
    Reuss, RH
    APPLIED PHYSICS LETTERS, 2000, 77 (20) : 3284 - 3286
  • [22] Beam-focusing characteristics of the diamond-film field emission arrays with parallel emitter, gates, and in-plane lens
    Zeng, BQ
    Liu, Y
    Yang, ZH
    Qian, SJ
    Yang, CF
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2002, 20 (06): : 2271 - 2274
  • [23] Close-packed silicon field emitter arrays with integrated anode fabricated by electron-beam lithography
    Ghotbi, S.
    Mohammadi, S.
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2023, 41 (01):
  • [24] Fabrication and electrical characterization of high aspect ratio silicon field emitter arrays
    Rangelow, IW
    Biehl, S
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2001, 19 (03): : 916 - 919
  • [25] Low leakage current fabrication of optically gated silicon field emitter arrays
    Liu, KX
    Heritage, JP
    IVMC 2000: PROCEEDINGS OF THE 14TH INTERNATIONAL VACUUM MICROELECTRONICES CONFERENCE, 2001, : 125 - 126
  • [26] Fabrication of silicon field emitter arrays with 0.1-μm-diameter gate by focused ion beam lithography
    Yamaoka, Yoshikazu
    Goto, Takashi
    Nakao, Masao
    Kanemaru, Seigo
    Itoh, Junji
    Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes & Review Papers, 1995, 34 (12 B): : 6932 - 6934
  • [27] Numerical analysis of carbon nanotube field emitter Arrays with embedded electron beam focusing structure
    Jun, PG
    Uh, HS
    Kwak, BH
    Noh, HW
    Park, SS
    Ko, SW
    Cho, ES
    Lee, JD
    TECHNICAL DIGEST OF THE 17TH INTERNATIONAL VACUUM NANOELECTRONICS CONFERENCE, 2004, : 88 - 89
  • [28] FABRICATION OF COLUMN-BASED SILICON FIELD EMITTER ARRAYS FOR ENHANCED PERFORMANCE AND YIELD
    TEMPLE, D
    BALL, CA
    PALMER, WD
    YADON, LN
    VELLENGA, D
    MANCUSI, J
    MCGUIRE, GE
    GRAY, HF
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1995, 13 (01): : 150 - 157
  • [29] Fabrication of silicon field-emitter arrays by using low-temperature processes
    Kang, SY
    Lee, JH
    Song, YH
    Cho, KI
    Kim, BW
    Kwon, KH
    Kim, DK
    JOURNAL OF THE KOREAN PHYSICAL SOCIETY, 1999, 35 : S444 - S446
  • [30] Fabrication and characterization of p-type silicon field-emitter arrays for lithography
    Teepen, TF
    van Veen, AHV
    van't Spijker, H
    Steenbrink, SWHK
    van Zuuk, A
    Heerkens, CTH
    Wieland, MJ
    van Druten, NJ
    Kruit, P
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2005, 23 (02): : 359 - 369
12345