Characterization of tantalum nitride thin films fabricated by pulsed Nd: YAG laser deposition method

被引：0

作者：

Kawasaki, H. ^{[1
]}

Doi, K. ^{[1
]}

Namba, J. ^{[1
]}

Suda, Y. ^{[1
]}

Ohshima, T. ^{[2
]}

Ebihara, K. ^{[2
]}

机构：

[1] Sasebo National Coll., Nagasaki, Japan

[2] Kumamoto Univ., Kumamoto, Japan

来源：

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers | 2001年 / 40卷 / 4 A期

关键词：

D O I：

10.1143/jjap.40.2391

中图分类号：

学科分类号：

摘要：

Thin films

引用

页码：2391 / 2394

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