Characterization of tantalum nitride thin films fabricated by pulsed Nd: YAG laser deposition method

被引：0
作者：
Kawasaki, H. [1 ]
Doi, K. [1 ]
Namba, J. [1 ]
Suda, Y. [1 ]
Ohshima, T. [2 ]
Ebihara, K. [2 ]
机构：
[1] Sasebo National Coll., Nagasaki, Japan
[2] Kumamoto Univ., Kumamoto, Japan
来源：
Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers | 2001年 / 40卷 / 4 A期
关键词：
D O I：
10.1143/jjap.40.2391
中图分类号：
学科分类号：
摘要：
Thin films
引用
收藏
页码：2391 / 2394
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