Functional images from chemically amplified resists

被引：0
|
作者：
Vekselman, A.M.
Zhang, C.
Darling, G.D.
机构：
来源：
Polymeric Materials Science and Engineering, Proceedings of the ACS Division of Polymeric Materials Science and Engineering | 1995年 / 72卷
关键词：
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
收藏
相关论文
共 50 条
  • [21] Chemically amplified X-ray resists
    Taylor, JW
    Babcock, C
    Sullivan, M
    IRRADIATION OF POLYMERIC MATERIALS: PROCESSES, MECHANISMS, AND APPLICATIONS, 1993, 527 : 224 - 244
  • [22] Line edge roughness of chemically amplified resists
    Azuma, T
    Chiba, K
    Imabeppu, M
    Kawamura, D
    Onishi, Y
    ADVANCES IN RESIST TECHNOLOGY AND PROCESSING XVII, PTS 1 AND 2, 2000, 3999 : 264 - 269
  • [23] Acid diffusion control in chemically amplified resists
    Kim, JB
    Choi, JH
    Kwon, YG
    Jung, MH
    Chang, KH
    POLYMER, 1999, 40 (04) : 1087 - 1089
  • [24] Chemically amplified resists: Past, present, and future
    Ito, H
    MICROLITHOGRAPHY 1999: ADVANCES IN RESIST TECHNOLOGY AND PROCESSING XVI, PTS 1 AND 2, 1999, 3678 : 2 - 12
  • [25] Modification of Chemically Amplified Resists by Radical Copolymerization
    Bulgakova, S.
    Johns, M.
    Kiseleva, E.
    MODERN TRENDS IN POLYMER SCIENCE-EPF 09, 2010, 296 : 127 - 132
  • [26] Photoacid diffusion in chemically amplified DUV resists
    Itani, T
    Yoshino, H
    Hashimoto, S
    Yamana, M
    Samoto, N
    Kasama, K
    ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 1997, 214 : 240 - PMSE
  • [27] Component segregation in model chemically amplified resists
    Woodward, John T.
    Fedynyshyn, Theodore H.
    Astolfi, David K.
    Cann, Susan
    Roberts, Jeanette M.
    Leeson, Michael J.
    ADVANCES IN RESIST MATERIALS AND PROCESSING TECHNOLOGY XXIV, 2007, 6519
  • [28] Enhanced Catalyst Mobility in Chemically Amplified Resists
    Bottoms, Christopher M.
    Terlier, Tanguy
    Stein, Gila E.
    Doxastakis, Manolis
    ADVANCES IN PATTERNING MATERIALS AND PROCESSES XXXIX, 2022, 12055
  • [29] NEW DIRECTIONS IN THE DESIGN OF CHEMICALLY AMPLIFIED RESISTS
    REICHMANIS, E
    GALVIN, ME
    UHRICH, KE
    MIRAU, P
    HEFFNER, SA
    POLYMERIC MATERIALS FOR MICROELECTRONIC APPLICATIONS: SCIENCE AND TECHNOLOGY, 1994, 579 : 52 - 69
  • [30] Chemically amplified deep UV resists for micromachining
    Hudek, P
    Rangelow, IW
    Kostic, I
    Grabiec, P
    Shi, F
    MICROMACHINING AND MICROFABRICATION PROCESS TECHNOLOGY II, 1996, 2879 : 182 - 193
12345