Studies of the plasma-enhanced chemical vapour deposition of tungsten on silicon and silicon dioxide substrates

被引：0

作者：

Wood, J. ^{[1
]}

Hodson, C.M.T. ^{[1
]}

机构：

[1] Univ of York, United Kingdom

来源：

Chemtronics | 1987年 / 2卷 / 04期

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D O I：

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学科分类号：

摘要：

引用

页码：172 / 174

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