Electron field emission from chemical vapor deposited diamond

被引：0
|
作者：
Zhu, W.
Kochanski, G.P.
Jin, S.
Seibles, L.
机构：
来源：
Journal of Vacuum Science & Technology B: Microelectronics Processing and Phenomena | 1996年 / 14卷 / 03期
关键词：
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
收藏
相关论文
共 50 条
  • [21] Effect of Au buffer on the field emission characteristics of chemical vapor deposited diamond films
    Lee, J.S.
    Liu, K.S.
    Chuang, F.Y.
    Sun, C.Y.
    Huang, C.M.
    Lin, I.N.
    Applied Surface Science, 1997, 113-114 : 264 - 268
  • [22] Effect of Au buffer on the field emission characteristics of chemical vapor deposited diamond films
    Lee, JS
    Liu, KS
    Chuang, FY
    Sun, CY
    Huang, CM
    Lin, IN
    IVMC '96 - 9TH INTERNATIONAL VACUUM MICROELECTRONICS CONFERENCE, TECHNICAL DIGEST, 1996, : 235 - 239
  • [23] Field emission characteristics of diamond films deposited by microwave plasma chemical vapor deposition
    Ji, H
    Jin, ZS
    Gu, CZ
    Lu, XY
    Zhou, GT
    Yuan, G
    Wang, WB
    DISPLAY DEVICES AND SYSTEMS II, 1998, 3560 : 161 - 163
  • [24] Effect of Au buffer on the field emission characteristics of chemical vapor deposited diamond films
    Lee, JS
    Liu, KS
    Chuang, FY
    Sun, CY
    Huang, CM
    Lin, IN
    APPLIED SURFACE SCIENCE, 1997, 113 : 264 - 268
  • [25] Field emission conduction mechanisms in chemical vapor deposited diamond and diamondlike carbon films
    May, PW
    Hohn, S
    Wang, WN
    Fox, NA
    APPLIED PHYSICS LETTERS, 1998, 72 (17) : 2182 - 2184
  • [26] Electron emission from diamond thin films deposited by microwave plasma-chemical vapor deposition method
    Gu, CZ
    Jin, ZS
    Wang, YG
    Jin, WC
    Ji, H
    Yuan, G
    Wang, WB
    DIAMOND AND RELATED MATERIALS, 2000, 9 (9-10) : 1604 - 1607
  • [27] Synchrotron radiation photoelectron emission microscopy of chemical-vapor-deposited diamond electron emitters
    Shovlin, J.D.
    Kordesch, M.E.
    Dunham, D.
    Tonner, B.P.
    Engel, W.
    Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, 1995, 13 (03): : 1111 - 1115
  • [28] Comparison of structure and electron-field-emission behavior of chemical-vapor-deposited diamond and pulsed-laser-deposited diamond-like carbon films
    Cheng, HF
    Chen, YC
    Wang, YL
    Chen, YY
    Tsau, BJ
    Chen, T
    Lin, IN
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 2000, 39 (4A): : 1866 - 1871
  • [29] Band gap structure and electron emission property of chemical-vapor-deposited diamond films
    Liu, JJ
    Chiu, DYT
    Morton, DC
    Kang, DH
    Zhirnov, VV
    Hren, JJ
    Cuomo, JJ
    SOLID-STATE ELECTRONICS, 2001, 45 (06) : 915 - 919
  • [30] Structure and field emission study of hot filament chemical vapor deposited nanocrystalline diamond films
    Arora, S. K.
    Vankar, V. D.
    Rao, D. V. Sridhara
    SYNTHESIS AND REACTIVITY IN INORGANIC METAL-ORGANIC AND NANO-METAL CHEMISTRY, 2007, 37 (06) : 481 - 484
12345