SOFT X-RAY DOSIMETRY AND ITS APPLICATION ON THE LITHOGRAPHY BEAMLINE AT SSRL.

被引：0

作者：

Seligson, Daniel ^{[1
]}

Pan, Lawrence ^{[1
]}

King, Paul ^{[1
]}

Pianetta, Piero ^{[1
]}

机构：

[1] Intel Corp, Santa Clara, CA, USA, Intel Corp, Santa Clara, CA, USA

来源：

Nuclear instruments and methods in physics research | 1987年 / A266卷 / 1-3期

关键词：

Special thanks to Troy Barbee; Jr. for providing multilayer crystals used in the monochromator and for suggesting that the GaAsP diodes be used. We would like to thank Cynthia Stein of Rohm and Haas Research Laboratories and Charles Anderson of Kodak Research Laboratories for making available very fast X-ray resists. Finally; we would like to thank Don Kania for supplying the diamond-turned aluminum cathodes. Three of the authors (P.K; L.P; P.P.) are supported by SSRL which is supported by the Department of Energy; Office of Basic Energy Sciences; the National Science Foundation; Division of Materials Re- search; and the National Institutes of Health; Biotechnology Resource Program; Division of Research Resources.The experiments were performed on the X-ray lithography beamline designated BLIII-4; at the Stanford Synchrotron Radiation Laboratory (SSRL). BLIII-4 is a bending magnet port; accepting 0.6 mrad horizontally * The work reported herein was (partially) done at SSRL which is supported by the Department of Energy;

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页码：612 / 618