Defect characterization in amorphous diamond-like carbon coatings

被引：0
|
作者：
Britton, D.T. [1 ]
Härting, M. [1 ]
Hempel, M. [1 ]
Gxawu, D. [2 ]
Uhlmann, K. [3 ]
机构：
[1] Department of Physics, University of Cape Town, 7701, Rondebosch, South Africa
[2] Department of Physics, Univ. of the N., QwaQwa Campus, 9866, Phutaditjhaba, South Africa
[3] Univ. der Bundeswehr München, Fachbereich Elektrotechnik, Wissenschaftliche Einrichtung Physik, D-85577 Neubiberg, Germany
来源：
Applied Surface Science | 1999年 / 149卷 / 01期
关键词：
Defects - Hydrogenation - Interfaces (materials) - Ion beams - Plasma enhanced chemical vapor deposition - Positrons - Silicon wafers;
D O I：
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中图分类号：
学科分类号：
摘要：
Amorphous diamond-like carbon coatings, produced by ion beam assisted physical vapour deposition (IBAD) and plasma enhanced chemical vapour deposition (PECVD) on Si(100) substrates have been studied by positron beam and other techniques. Both layers have similar positron annihilation characteristics and a density of 2.4±0.3 g cm-3, and are probably significantly hydrogenated. In the IBAD sample there is significant damage to the substrate, including a deep armorphized region and evidence of defect states at the interface to the carbon.
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页码：130 / 134
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