Impact of reductive N2/H2 plasma on porous low-dielectric constant SiCOH thin films

被引：0
|
作者：
Cui, Hao [1 ]
Carter, Richard J. [1 ]
Moore, Darren L. [1 ]
Peng, Hua-Gen [2 ]
Gidley, David W. [2 ]
Burke, Peter A. [1 ]
机构：
[1] LSI Logic Corporation, 23400 NE Glisan Street, Gresham, OR 97030, United States
[2] Department of Physics, University of Michigan, Ann Arbor, MI 48109, United States
来源：
Journal of Applied Physics | 2005年 / 97卷 / 11期
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