Preparation of titanium dioxide thin films by means of a hot wall technique

被引：1

作者：

Nakamura, Takato ^{[1
]}

Asai, Hiroshige ^{[1
]}

Akiyama, Mikiya ^{[1
]}

Azuma, Naoto ^{[1
]}

Takahashi, Naoyuki ^{[1
]}

Ishino, Kenei ^{[1
]}

Fujiyasu, Hiroshi ^{[1
]}

Yoshioka, Masayuki ^{[2
]}

机构：

[1] Faculty of Engineering, Shizuoka University, 3-5-1 Johoku, Hamamatsu 432-8561, Japan

[2] Shizuoka Indust. Res. Inst. S., 2078 Makigaya, Shizuoka, 421-12, Japan

来源：

Applied Surface Science | 1999年 / 142卷 / 01期

关键词：

This work was supported by the Research for the Future Programme of The Japan Society for the Promotion of Science under contract No. [!text type='JS']JS[!/text]PS-RFTF96R12501;

D O I：

暂无

中图分类号：

学科分类号：

摘要：

引用

页码：182 / 187