High current Ni-ion implantation into Al films

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作者：
Gao, K.Y. [1 ]
Liu, B.X. [1 ]
机构：
[1] Tsinghua Univ, Beijing, China
来源：
Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms | 1997年 / 132卷 / 01期
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页码：68 / 72
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