New dry surface-imaging process for X-ray lithography

被引：0
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作者：
Ogawa, Taro [1 ]
Yamaguchi, Atsuko [1 ]
Soga, Takashi [1 ]
Tachibana, Hiroaki [1 ]
Matsumoto, Mutsuyoshi [1 ]
Oizumi, Hiroaki [1 ]
Takeda, Eiji [1 ]
机构：
[1] Hitachi, Ltd, Tokyo, Japan
来源：
| 1600年 / JJAP, Minato-ku, Japan卷 / 33期
关键词：
X ray lithography;
D O I：
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