Simulation of the dynamics process of pulsed laser deposition of KTN thin film

The dynamics process of pulsed laser deposition of KTN thin film has been simulated by using the fluid dynamics theory. The expansion process of plasma, the spatial thickness distribution of KTN thin film deposited by pulsed laser, and the dependence of the thickness on the substrate-target distance are studied and discussed. The results show that the plasma is argued with pressure gradients in the direction perpendicular to the target surface and the thickness distribution of KTN thin film is not uniform, showing a similar Gaussian profile. The variation in the maximum thickness of the deposit with substrate-target distance L can be expressed in the form of dmax varies directly as L-2. The calculated results are in good agreement with the experiments.