Selective tungsten chemical vapor deposition with high deposition rate for ULSI application

被引：0
|
作者：
Suzuki, Hiroshi [1 ]
Maeda, Yuuji [1 ]
Morita, Kenji [1 ]
Morita, Mizuho [1 ]
Ohmi, Tadahiro [1 ]
机构：
[1] Tohoku Univ, Sendai, Japan
来源：
Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers | 1994年 / 33卷 / 1 B期
关键词：
3;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
收藏
页码：451 / 454
相关论文
共 50 条
  • [1] SELECTIVE TUNGSTEN CHEMICAL-VAPOR-DEPOSITION WITH HIGH DEPOSITION RATE FOR ULSI APPLICATION
    SUZUKI, H
    MAEDA, Y
    MORITA, K
    MORITA, M
    OHMI, T
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1994, 33 (1B): : 451 - 454
  • [2] Deposition properties of selective tungsten chemical vapor deposition
    Yeh, WK
    Chen, MC
    Wang, PJ
    Liu, LM
    Lin, MS
    MATERIALS CHEMISTRY AND PHYSICS, 1996, 45 (03) : 284 - 287
  • [3] Anomalous selective tungsten growth by chemical vapor deposition
    Mei, YJ
    Chang, TC
    Sheu, JD
    Yeh, WK
    Pan, FM
    Chang, CY
    ADVANCED METALLIZATION FOR FUTURE ULSI, 1996, 427 : 399 - 405
  • [4] Chemical vapor deposition of TiN for ULSI applications
    Eizenberg, M
    ADVANCED METALLIZATION FOR FUTURE ULSI, 1996, 427 : 325 - 335
  • [5] Improvement of deposition rate by sandblasting of tungsten wire in catalytic chemical vapor deposition
    Heya, A
    Niki, T
    Takano, M
    Doguchi, Y
    Yonezawa, Y
    Minamikawa, T
    Muroi, S
    Minami, S
    Izumi, A
    Masuda, A
    Umemoto, H
    Matsumura, H
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 2005, 44 (4A): : 1943 - 1944
  • [6] The novel precleaning treatment for selective tungsten chemical vapor deposition
    Chang, TC
    Mor, YS
    Liu, PT
    Sze, SM
    Yang, YL
    Tsai, MS
    Chang, CY
    THIN SOLID FILMS, 1999, 355 : 451 - 455
  • [7] SELECTIVE CHEMICAL VAPOR-DEPOSITION OF TUNGSTEN FOR MICROELECTROMECHANICAL STRUCTURES
    MACDONALD, NC
    CHEN, LY
    YAO, JJ
    ZHANG, ZL
    MCMILLAN, JA
    THOMAS, DC
    HASELTON, KR
    SENSORS AND ACTUATORS, 1989, 20 (1-2): : 123 - 133
  • [8] CHEMICAL-VAPOR-DEPOSITION OF ALUMINUM FOR ULSI APPLICATIONS
    RHEE, SW
    KOREAN JOURNAL OF CHEMICAL ENGINEERING, 1995, 12 (01) : 1 - 11
  • [9] Chemical vapor deposition of tungsten oxide
    Kirss, RU
    Meda, L
    APPLIED ORGANOMETALLIC CHEMISTRY, 1998, 12 (03) : 155 - 160
  • [10] Chemical Vapor Deposition of Tungsten Oxide
    Appl Organomet Chem, 3 (155):
12345