Development on excimer laser lithography

被引：0
|
作者：
Tian, Wenyan [1 ]
Zeng, Chuanxiang [1 ]
Pan, Daren [1 ]
Zhou, Yewei [1 ]
机构：
[1] Sichuan Univ, Chengdu, China
来源：
Jiguang Zazhi/Laser Journal | 1992年 / 13卷 / 03期
关键词：
Lithography--Laser Applications;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
The developments of excimer laser lithography have been reviewed. The emphasis of discussion is placed on the advantage of excimer laser lithography, the development on resolution advancement and the trend from now on have been discussed as well.
引用
收藏
页码：113 / 116
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