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FUNDAMENTAL PARAMETERS OF ION PLATING.
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Leder, Lewis Beebe
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The substrate is the cathode and the material source the anode of a glow discharge in a gas, usually argon. The substrate can be sputter-cleaned before and during deposition. Primary problems are the high currents required to plate large parts, and the effect on field conformity and field strength (especially on corners and points) of substrate shape, due to high voltage. Also, the deposit may be deficient in certain chemical elements, if the plating compound can decompose into positive and negative ions.
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页码：41 / 45
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