ELECTROSTATIC GETTERING OF FOREIGN MATERIALS IN SEMICONDUCTOR MANUFACTURING TOOLS.

被引：0
作者：
Halbot, M.
Hodeau, M.
Thiefain, P.
机构：
来源：
| 1600年 / 27期
关键词：
D O I：
暂无
中图分类号：
学科分类号：
摘要：
SEMICONDUCTOR DEVICE MANUFACTURE
引用
收藏
相关论文
共 50 条
[31]   Role of New Materials in Enhancing Productivity of Semiconductor Manufacturing Equipment [J].
Foggiato, John .
2009 IEEE/SEMI ADVANCED SEMICONDUCTOR MANUFACTURING CONFERENCE, 2009, :124-127
[32]   MEASUREMENTS OF ALPHA-EMITTING CONTAMINANTS IN SEMICONDUCTOR MANUFACTURING MATERIALS [J].
BOULDIN, DP .
ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 1980, 180 (AUG) :147-NUCL
[33]   State of the Art Optical Materials for Lithographic Systems for Semiconductor Manufacturing [J].
Takke, Ralf ;
Kuehn, Bodo ;
Thomas, Stephan .
2014 CONFERENCE ON LASERS AND ELECTRO-OPTICS (CLEO), 2014,
[34]   Applications of FTIR in identification of foreign materials for biopharmaceutical clinical manufacturing [J].
Li, Guiyang ;
Torraca, Gianni ;
Jing, Wendy ;
Wen, Zai-qing .
VIBRATIONAL SPECTROSCOPY, 2009, 50 (01) :152-159
[35]   AUTOMATED GENERATION OF ANALYTICAL PROCESS TIME MODELS FOR CLUSTER TOOLS IN SEMICONDUCTOR MANUFACTURING [J].
Kohn, Robert ;
Rose, Oliver .
PROCEEDINGS OF THE 2011 WINTER SIMULATION CONFERENCE (WSC), 2011, :1803-1815
[36]   Commonality Analysis for Detecting Failures Caused by Inspection Tools in Semiconductor Manufacturing Processes [J].
An, Dae Woong ;
Kim, Seung ;
Kim, Hyun Kyu ;
Kim, Chang Ouk .
IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING, 2022, 35 (04) :596-604
[37]   A simulation-based analysis of the cycle time of cluster tools in semiconductor manufacturing [J].
Niedermayer, H ;
Rose, O .
SIMULATION IN INDUSTRY, 2003, :349-354
[38]   Optimization of Assembly Processes Based on Lean Manufacturing Tools. Case Studies: Television and Printed Circuit Boards (PCB) Assemblers [J].
Cuesta, Silvana ;
Siguenza-Guzman, Lorena ;
Llivisaca, Juan .
APPLIED TECHNOLOGIES (ICAT 2019), PT III, 2020, 1195 :443-454
[39]   Polymer materials and processing methods for environmentally friendly semiconductor manufacturing. [J].
Pham, VQ ;
Felix, N ;
Jakubek, V ;
Mao, Y ;
Gleason, KK ;
Ober, CK .
ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 2004, 227 :U449-U449
[40]   Nanoimprint System for High Volume Semiconductor Manufacturing; Requirement for Resist Materials [J].
Ito, Toshiki ;
Emoto, Keiji ;
Takashima, Tsuneo ;
Sakai, Keita ;
Liu, Weijun ;
DeYoung, James ;
Ye, Zhengmao ;
LaBrake, Dwayne .
JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY, 2016, 29 (02) :159-168
12345