PREPARATION AND PROPERTIES OF a-Si:H/a-SiNx:H SUPERLATTICE FILMS.

被引：0
|
作者：
Wang, Zhichao [1 ]
Liu, Xiangna [1 ]
He, Yuliang [1 ]
Wu, Rulin [1 ]
机构：
[1] Nanjing Univ, China, Nanjing Univ, China
来源：
Pan Tao Ti Hsueh Pao/Chinese Journal of Semiconductors | 1987年 / 8卷 / 01期
关键词：
CRYSTALS - SEMICONDUCTING SILICON COMPOUNDS;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
The preparation method, structure and optical quantum size effect of a-Si:H/a-SiN//x: H superlattice films are reported.
引用
收藏
页码：94 / 98
相关论文
共 50 条
  • [21] STUDIES ON STRESS CHANGES WITH ANNEALING TEMPERATURE FOR AMORPHOUS SEMICONDUCTOR a-Si:H/a-SiNx:H MULTILAYER FILMS
    王万录
    Science Bulletin, 1988, (10) : 827 - 831
  • [22] The constrained growth and patterned distribution of nc-Si from a-SiNx/a-Si:H/a-SiNx:: mechanism and experiments
    Chen, KJ
    Chen, K
    Wu, LC
    Ma, ZY
    Han, PG
    Li, W
    Zhang, L
    Zhang, YJ
    Huang, XF
    Kinetics-Driven Nanopatterning on Surfaces, 2005, 849 : 205 - 209
  • [23] The constrained growth of uniform nc-Si grains from a-SiNx/a-Si:H/a-SiNx:: mechanism and experiments
    Chen, K
    Chen, KJ
    Zhang, L
    Huang, XF
    JOURNAL OF NON-CRYSTALLINE SOLIDS, 2004, 338 : 131 - 134
  • [24] Structural and Electrical Characterization of Nanostructured a-SiNx:H PECVD Films.
    Ribeiro, M.
    Abe, I. Y.
    Pereyra, I.
    MICROELECTRONICS TECHNOLOGY AND DEVICES - SBMICRO 2011, 2011, 39 (01): : 123 - 129
  • [25] Effect of hydrogen radical exposure on the interfacial and bulk structure of a-Si:H/a-SiNx:H multilayer films
    Han, GR
    Du, PY
    Shou, JH
    Zhao, DM
    THIN SOLID FILMS, 1998, 334 (1-2) : 6 - 10
  • [26] a-Si:H/a-SiNx:H超晶格薄膜的光学性质
    王志超
    刘湘娜
    冯小梅
    耿晰昇
    物理学报, 1988, (02) : 189 - 196
  • [27] Induced defects in a-Si:H/a-SiNx:H multilayers by use of EMT and PAT
    Gu, WZ
    Wang, ZC
    Sun, MX
    SUPERLATTICES AND MICROSTRUCTURES, 1998, 23 (05) : 991 - 997
  • [28] Characterization of a-SiNx:H/a-Si:H MIS structure using capacitance techniques
    Park, HR
    Lee, SH
    Lee, BT
    JOURNAL OF THE KOREAN PHYSICAL SOCIETY, 2001, 39 : S141 - S146
  • [29] The effect of post-treatments on crystallization in a-Si:H/a-SiNx:H multilayers
    Wang, L
    Wang, XW
    Huang, XF
    Ma, ZY
    Bao, Y
    Shi, JJ
    Li, W
    Xu, J
    Chen, KJ
    JOURNAL OF NON-CRYSTALLINE SOLIDS, 2002, 299 : 751 - 755
  • [30] a-Si∶H/a-SiNx∶H超晶格薄膜的光声谱
    邱树业
    王志超
    刘湘娜
    冯小梅
    南京大学学报(自然科学版), 1990, (01) : 32 - 38
12345