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- [41] Hydrogen in a-Si:H deposited by an expanding thermal plasma:: A temperature, growth rate and isotope study AMORPHOUS AND MICROCRYSTALLINE SILICON TECHNOLOGY-1998, 1998, 507 : 529 - 534
- [42] Aluminum recycling from reactor walls: A source of contamination in a-Si:H thin films JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2010, 28 (06): : 1381 - 1387
- [43] Structural changes in a-Si:H films deposited on the edge of crystallinity Materials Research Society Symposium - Proceedings, 1999, 557 : 269 - 274
- [44] Structural changes in a-Si:H films deposited on the edge of crystallinity AMORPHOUS AND HETEROGENEOUS SILICON THIN FILMS: FUNDAMENTALS TO DEVICES-1999, 1999, 557 : 269 - 274
- [45] Annealing treatment of a-Si: H films deposited by PECVD and their properties 3RD INTERNATIONAL CONFERENCE ON FUNCTIONAL MATERIALS SCIENCE 2016, 2017, 196
- [46] Study on properties of a-Si:H films deposited by magnetron sputtering Guangzi Xuebao/Acta Photonica Sinica, 2008, 37 (SUPPL.): : 128 - 130
- [48] Effect of α-irradiation of energy 0.5 MeV on the hydrogen bonding in a-Si:H thin films RADIATION EFFECTS AND DEFECTS IN SOLIDS, 2004, 159 (07): : 431 - 437
- [49] Stability improvement of a-Si:H films deposited in SQWM 55 kHz glow discharge plasma AMORPHOUS AND MICROCRYSTALLINE SILICON TECHNOLOGY-1998, 1998, 507 : 493 - 498